Benzanthrone polymerization gate in photopolymerizable compositions
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United States of America Patent
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Aug 6, 1996
Grant Date -
N/A
app pub date -
Feb 24, 1995
filing date -
Feb 24, 1995
priority date (Note) -
Expired
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Abstract
A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.
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