Integrated laser ablation deposition system
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United States of America Patent
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Jul 9, 1996
Issued Date -
N/A
app pub date -
May 10, 1994
filing date -
Mar 13, 1992
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A laser ablation deposition system includes a movable platform for supporting ferroelectric target material and a support structure for supporting a thermally sensitive semiconductor substrate within a chamber mounted on a moveable cabinet, and a laser for ablating the material mounted on a support frame along with various control components. The cabinet with the chamber may be moved away from the laser and support frame to allow the chamber to be raised to provide access to the components within the chamber. The system may be used to fabricate a multilayer thin film device using multicomponent oxides.
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