Process for the production of partially reduced indium oxide-tin oxide targets
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United States of America Patent
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Jul 2, 1996
Grant Date -
N/A
app pub date -
Feb 6, 1995
filing date -
Apr 18, 1994
priority date (Note) -
Expired
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Abstract
The tin-containing component of a powder mixture includes SnO and is subjected to a mixing treatment with the In.sub.2 O.sub.3 before compaction to adjust the degree of reduction of the sputtering target in a simple and reproducible manner.
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