Deposition apparatus and method
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United States of America Patent
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Feb 20, 1996
Grant Date -
N/A
app pub date -
Aug 1, 1994
filing date -
Dec 4, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A reactor 10 defines a chamber 11 in which are disposed an upper electrode 12 and a lower workpiece electrode 13. The upper electrode is connected to a R.F. supply whilst the lower electrode is connected to a stress control unit 14. The stress control unit is used to adjust or maintain the effective resistance of the connection between the workpiece electrode 13 and ground.
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