Sputter target for cathodic atomization to produce transparent, conductive layers
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United States of America Patent
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Jan 2, 1996
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app pub date -
Nov 9, 1994
filing date -
Mar 9, 1994
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Abstract
A target for production of transparent electrically conductive layers by cathode sputtering is produced from indium oxide-tin oxide powder mixtures or coprecipitated indium oxide-tin oxide powders. A target with especially high mechanical strength consists of an oxide ceramic material into which metallic phase components have been incorporated in a uniform and finely distributed manner and which has a density of more than 96% of the theoretical density of indium oxide/tin oxide consisting purely of oxide.
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