Second harmonic generation and self frequency doubling laser materials comprised of bulk germanosilicate and aluminosilicate glasses
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United States of America Patent
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Dec 26, 1995
Issued Date -
N/A
app pub date -
May 8, 1995
filing date -
Jun 27, 1991
priority date (Note) -
Expired
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Abstract
A method for preparing a material so as to exhibit second harmonic generation for optical radiation that passes through the material. The method includes a first step of providing a bulk glass comprised of substitutionally doped silica and a charge transfer dopant. The bulk glass is prepared for frequency doubling in accordance with a method that includes a step of irradiating the bulk glass with optical radiation having a first wavelength and a second wavelength, the bulk glass being irradiated for a period of time sufficient to obtain a desired amount of conversion efficiency of the first wavelength into the second wavelength. The silica is substitutionally doped with an element selected from the group consisting of Ge and Al, and the charge transfer dopant is selected from the group consisting of Ce.sup.3+, Nd.sup.3+, and Eu.sup.2+. In another embodiment of the invention the silica is substitutionally doped with Ge and the charge transfer dopant is comprised of naturally existing Ge defects. The bulk glass may be provided as a monolithic body, a preform, a coating, a layer, or as a film. Optical devices incorporating a bulk glass SHG converter and self-frequency doubling glass lasers are described.
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