Unitary wafer plasma enhanced chemical vapor deposition holding device
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United States of America Patent
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Dec 26, 1995
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N/A
app pub date -
Dec 3, 1993
filing date -
Dec 3, 1993
priority date (Note) -
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Abstract
There is a unitary wafer plasma enhanced chemical vapor deposition (PECVD) holding device. Particularly, there is a unitary device used for holding and rotating wafers during deposition of materials. Uniquely, single wafer holder arms 31 can be mounted and removed from the unitary device. Additionally, each wafer holding arm can individually calibrate the alignment between the parallel pair of arms and calibrate the wafer positioning to the heater. For example, using a simple screw to bias the positioning of the arms.
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