Polymerisable compositions containing tetraacrylates

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United States of America Patent

PATENT NO 5470689
SERIAL NO

08200982

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Abstract

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Photopolymerisable compositions comprising (a) a tetraacrylate of formula I or II ##STR1## wherein R.sub.1 is a hydrogen atom or methyl, X.sub.1 and X.sub.2 are each independently of the other --O-- or --CO--O--, R.sub.2 is a divalent aliphatic, cycloaliphatic or aromatic radical of a diglycidyl compound that contains no more glycidyl ether or ester groups, A is a divalent aliphatic, cycloaliphatic or aromatic radical of a diisocyanate compound that contains no more isocyanate groups, n is an integer from 1 to 8, and R.sub.3 is a tetravalent cycloaliphatic radical of a diepoxide compound that contains no more 1,2-epoxide groups at the cycloaliphatischen ring, (b) at least one liquid radically polymerisable compound that differs from component a), and (c) a radical photoinitiator, are suitable preferably for the production of three-dimensional objects by the stereolithographic technique.

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Patent Owner(s)

Patent OwnerAddress
HUNTSMAN INTERNATIONAL LLC10003 WOODLOCH FOREST DRIVE THE WOODLANDS TX 77380

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hunziker, Max Dudingen, CH 27 612
Schulthess, Adrian Tentlingen, CH 42 765
Steinmann, Bettina Praroman, CH 33 810
Wolf, Jean-Pierre Courtaman, CH 63 1014

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