Method for purification of etching solution
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United States of America Patent
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Nov 28, 1995
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N/A
app pub date -
Sep 15, 1994
filing date -
Sep 17, 1993
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Abstract
A method for purifying an etching solution consisting of an aqueous phosphoric acid solution which has been used in etching of a silicon nitride film. In the process, hydrogen fluoride is added to an etching solution consisting of an aqueous phosphoric acid solution which has been used for etching of a silicon nitride film, and the resulting solution is heated to remove fluorides of silicon as reaction products of hydrogen fluoride with silicon compounds which have been contained in the etching solution together with vaporized water.
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