Method for producing a silica mask on metal oxide surface
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United States of America Patent
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Nov 14, 1995
Grant Date -
N/A
app pub date -
Jun 15, 1994
filing date -
Feb 4, 1994
priority date (Note) -
Expired
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Abstract
A method for producing a silica mask on metal oxide surface is disclosed. Benzaldehyde is adsorbed on neutral or weak alkaline metal oxide surface, and then tetra-methoxy silane is deposited. The tetra-methoxy silane is hydrolyzed by water vapor into silica and the adsorbed benzaldehyde is removed by NH3 as benzo-nitrile. Thus a silica mask is produced on the metal oxide surface, and the mask has vacancies corresponding to the removed benzaldehyde. The vacancies act as the adsorption sites for shape selective adsorption.
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