PS plate and method for processing same
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United States of America Patent
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Nov 7, 1995
Grant Date -
N/A
app pub date -
Jul 15, 1993
filing date -
Jul 16, 1992
priority date (Note) -
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Abstract
A PS plate comprises an aluminum substrate having anodized layers on both sides, a photosensitive layer on one side of the substrate and a coating layer of a metal oxide obtained by hydrolyzing and polycondensing an organic or inorganic metal compound on the side of the substrate opposite to that carrying the photosensitive layer. The PS plate is processed by a method comprising the steps of imagewise exposing it to light and then developing the imagewise exposed plate with an alkali aqueous solution containing an alkali metal silicate and having a pH of not less than 12. The PS plate and the method for processing the same permit substantial reduction of the amount of a replenisher for development to be supplemented and ensure a stable processing of the plate over a long time period without accompanying formation of insolubles in a developer. The PS plates never cause adhesion and peeling off of the photosensitive layers even when they are put in stacks. Moreover, the PS plate does not suffer from a problem of contamination of the back face due to adhesion of lipophilic substances such as a developing ink.
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