Photocurable composition, flexible, photosensitive articles made therefrom, and methods of improving solvent resistance and flexibility of those articles

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5462835
SERIAL NO

07760430

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

An aqueous developable, photocurable composition and a method of improving solvent resistance and flexibility are disclosed. The composition comprises (a) an acid-containing copolymer having an acid ephr of at least 0.20 and (b) an acid-containing polymer suitable for flexibilizing the composition, which has at least one free ethylenically unsaturated group. It is preferable that either (a) or (b) or both are further reacted with a compound having a free ethylenically unsaturated group and a free acid reactive group, e.g. glycidyl(meth)acrylate. When the composition is formulated with an ethylenically unsaturated monomer and photoinitiator, the photocurable composition is especially suitable for use in an aqueous developable, flexible printing plate.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
PT SUB INC1031 CENTRE ROAD WILMINGTON DE 19805

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mirle, Srinivas K Ellicott City, MD 9 281
Williams, Trevor J Mableton, GA 3 56

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation