Gas phase process for the production of 1,1-dichloro-1-fluoroethane and/or 1-chloro-1,1-difluoroethane from vinylidene chloride
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United States of America Patent
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Sep 12, 1995
Issued Date -
N/A
app pub date -
Aug 23, 1993
filing date -
Apr 5, 1989
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Abstract
A novel gas phase process for the production of 1,1-dichloro-1-fluoroethane from vinylidene chloride and hydrogen fluoride is provided. The process is characterized by high conversion of vinylidene chloride to product, with a high selectivity for 1,1-dichloro-1-fluoroethane. The process may also be operated to selectively form 1-chloro-1,1-difluoroethane. Few volatile by-products and substantially no tar or oligomeric material is formed. Catalyst performance remains constant over extended periods of time.
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