Method for removing metal impurities from resist components

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United States of America Patent

PATENT NO 5446125
SERIAL NO

07753488

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Abstract

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A method of removing metal impurities from a resist component, comprising the steps of: (a) dissolving said resist component in a solvent; (b) contacting said resist component solution with a cation exchange resin and a chelate resin for a sufficient amount of time to absorb at least a portion of said metal impurities onto said cation exchange and chelate resins; and (c) separating said cation exchange and chelate resins bearing said metal impurities from said resist component solution.

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Patent Owner(s)

Patent OwnerAddress
OLIN MICROELECTRONIC CHEMICALS INCP O BOX 4500 501 MERRITT 7 NORWALK CT 06856

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ferreira, Lawrence Fall River, MA 17 219
Fitzgerald, Edward A Barrington, RI 2 63
Honda, Kenji Barrington, both of, RI 107 1884

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