Method and apparatus for forming thin film and multilayer film
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United States of America Patent
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Aug 22, 1995
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N/A
app pub date -
Oct 12, 1994
filing date -
Jun 4, 1991
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Abstract
A thin film is formed on a substrate in a reaction chamber using a photo CVD technique by decomposing a reactive gas supplied to the reaction chamber by means of light irradiated through a light introducing window. The reduction in film deposition rate due to clouding of the light introducing window is corrected in order to form a thin film of a desired film thickness.
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