Multiple filament enhanced ion source
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United States of America Patent
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Aug 1, 1995
Issued Date -
N/A
app pub date -
Mar 19, 1993
filing date -
Oct 10, 1990
priority date (Note) -
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Abstract
An improved ion source is provided with multiple filaments and wiring for selectively connecting various combinations of filaments to a current source. In one embodiment an additional filament is a spare filament which is connected to the current source when the primary filament burns out. This decreases down time due to filament replacement. In another embodiment, an additional filament operates simultaneously with a primary filament to provide a more homogenous electron cloud and to increase filament life.
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