Apparatus for drawing paste pattern on substrate
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United States of America Patent
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Aug 1, 1995
Grant Date -
N/A
app pub date -
Jul 24, 1992
filing date -
Jul 24, 1991
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus for drawing a pattern of a photoresist on a substrate has a nozzle for discharging the paste and a substrate-supporting table movable along the X and Y-axes relative to the paste drawing opening of the nozzle. The nozzle is fixed to a Z-axis table which carries an optical displacement meter which measures the clearance between the substrate and the paste discharging opening. According to the results of the measurements, the Z-axis table is moved toward and away from the substrate so that the clearance is maintained at a desired distance. The optical displacement meter has a measuring point on the substrate. The measuring point is positioned so as not to interfere with the paste line which is drawn on the substrate with paste discharged from the nozzle.
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