Ion-optical imaging system

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United States of America Patent

PATENT NO 5436460
SERIAL NO

08058911

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Abstract

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A system for ion-beam imaging of a structure of a mask on a wafer has a two-lens set between the mask and the wafer which is made up of a preferably accelerating Einzel lens proximal to the mask and an asymmetric accelerating Einzel proximal to the wafer.

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Patent Owner(s)

Patent OwnerAddress
IMS IONEN MIKROFABRIKATIONS SYSTEME GESELLSCHAFT M B HSCHREYGASSE 3 A-1020 VIENNA AUSTRIA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chalupka, Alfred Vienna, AT 20 1591
Stengl, Gerhard Wernberg, AT 39 2026
Vonach, Herbert Klosterneuberg, AT 10 232

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