Proximity exposure method and machine therefor
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United States of America Patent
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Jul 18, 1995
Grant Date -
N/A
app pub date -
Feb 10, 1994
filing date -
Apr 13, 1993
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A proximity exposure method and apparatus therefor. Replications of mask patterns are carried out, wherein as a mask closely approaches a substrate, the displacement of the mask is detected, and the atmospheric pressure between the mask and the substrate, or around the side of the mask opposite the substrate is controlled so as to cancel the displacement of the mask. The apparatus includes positioning apparatus, a light source for exposing the mask pattern, displacement measuring means, and atmospheric pressure controlling means.
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