Target cooling system with trough

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United States of America Patent

PATENT NO 5421978
SERIAL NO

08174149

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Abstract

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Cathode sputtering apparatus includes a target, a cooling channel, and a flexible diaphragm therebetween. The target is fixed to a base independently of the diaphragm, so that the target can be replaced with disturbing the cooling channel. In a preferred embodiment, the diaphragm and the target are fixed by respective sets of cleats retained by screws received from respective opposite directions.

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Patent Owner(s)

Patent OwnerAddress
APPLIED FILMS GMBH & CO KGSIEMENSSTRASSE 100 D-63755 ALZENAU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Joos, Gerhard Grossostheim, DE 5 43
Schilling, Helmut Rodenbach, DE 1 18
Schuhmacher, Manfred Alzenau, DE 12 121

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