Method for forming metal-oxide-modified porous ceramic membranes
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United States of America Patent
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May 16, 1995
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N/A
app pub date -
Jan 10, 1994
filing date -
Jan 10, 1994
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Expired
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Abstract
A novel membrane preparation process via chemical vapor deposition (CVD) deposits a film on a microporous ceramic support at a low temperature (300.degree. to 550.degree. C.) with organic metallic compounds as precursors and then converts the film into porous oxide at a higher temperature (350.degree. C. to 800.degree. C., preferably 450.degree. C. to 600.degree. C.) to increase its permeability and stability at a given process application temperature. The novel membrane is used for gas separations at an elevated temperature (300.degree. C. to 800.degree. C.). The novel membrane can be used as a catalytic membrane reactor which selectively removes one of the reaction products, thereby enhancing the conversion of the reaction. The ultrafiltration membrane provides gaseous mixtures separation media having high permeance and superior hydrogen selectivity.
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