Coil configurations for improved uniformity in inductively coupled plasma systems
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United States of America Patent
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Mar 28, 1995
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N/A
app pub date -
Mar 8, 1993
filing date -
Mar 8, 1993
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Abstract
The present invention relates to an apparatus for generating a low pressure plasma circulating in a planar direction within a process enclosure. The invention generates plasma having substantially uniform density characteristics across a planar axis. The invention achieves improved uniformity of the plasma density by delivering more radio frequency power toward the periphery of the circulating plasma than toward the center of the plasma. Increasing the periphery power to the circulating plasma compensates for increased plasma losses due to interaction with the side walls of the process containment enclosure.
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