Partial coherence varier for microlithographic system

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United States of America Patent

PATENT NO 5383000
SERIAL NO

07981051

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Abstract

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A microlithographic projection imaging system has an illuminator optical system and an objective imaging system, and an adjustable profiler or energy distributor in the illuminator optical system varies the numerical aperture of the illuminator, for varying the partial coherence of the projection imager. The adjustable profiler can be a diffuser, a binary optic, a hologram, or a fly's eye lens that is axially movable in a non-collimated region of the illumination path for imposing a predetermined angular profile on each of a multitude of fragments of the illumination. This changes the distribution of the illumination energy at the pupil of the illuminator and thus varies the numerical aperture and the angular energy profile of the illumination arriving at the objective imaging system, which is also preferably made uniform in spatial intensity by a uniformizer in the illuminator upstream of the pupil.

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Patent Owner(s)

Patent OwnerAddress
ULTRATECH STEPPER EAST INC7 STATTUCK ROAD ANDOVER MA 01801
ULTRATECH STEPPER INC3230 SCOTT BOULEVARD SANTA CLARA CA 95052-8103

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Michaloski, Paul F Rochester, NY 7 409
Partlo, William N Fairport, NY 183 6942

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