Acid labile solution inhibitors and positive- and negative-acting photosensitive composition based thereon
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 10, 1995
Issued Date -
N/A
app pub date -
Jan 22, 1993
filing date -
Sep 13, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy, R.sub.2 is hydrogen, alkyl, cycloalkyl or aryl, R.sub.3 is a saturated or unsaturated hydrocarbon radical, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, alkyl, alkoxy or aryloxy, and X is a direct single bond or a methylene or ethylene bridge. These compounds are especially suitable for the preparation of photoresist compositions which can be used both for the production of positive as well as negative images. The photoresists are preferably used for deep-UV microlithography.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully