Particle-beam imaging system
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United States of America Patent
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-
Jan 3, 1995
Grant Date -
N/A
app pub date -
Mar 30, 1993
filing date -
Mar 30, 1992
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In an ion optical imaging system, especially for lithographic imaging on a wafer, two collecting lenses are provided between the mask and the wafer. At least one of the collecting lenses is a three-electrode grid lens, i.e. a lens in which a grid is disposed perpendicular to the optical axis between a pair of tubular electrodes.
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