Process for removing gaseous hydrides from a solid support comprising metallic oxides
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 3, 1995
Issued Date -
N/A
app pub date -
Jul 16, 1992
filing date -
Sep 22, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The invention concerns a process for removing gaseous hydrides from a solid support of metallic oxides, which consists in causing a gas flow to circulate, at room temperature, on a solid support comprising at least copper and chromium and having a specific area lower than or equal to 100 m.sup.2 /g. This process may be used for the destruction of gaseous hydrides from the industry of semi-conductors, for example silanes, arsine, phosphine, diborane, germane, stannane, gallane, stibine, and hydrogen telluride, selenide and sulfide.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully