Methods for treating photoresists
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United States of America Patent
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Nov 22, 1994
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N/A
app pub date -
Sep 21, 1992
filing date -
Sep 21, 1992
priority date (Note) -
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Abstract
The present invention comprises methods for treating photoresists and forming photoresist relief images, including a method comprising providing a photoresist coating having a crosslinked surface layer, treating the photoresist coating with an organometallic material, and developing the photoresist coating to provide a relief image comprising an etch resistant effective amount of organometallic material.
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