Method for making a patterned resist substrate composite
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United States of America Patent
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Nov 8, 1994
Issued Date -
N/A
app pub date -
Feb 14, 1994
filing date -
Jun 13, 1986
priority date (Note) -
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Abstract
A method for preparing a positive photoresist substrate composite is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.
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