Process for modifying fluorine resin surfaces

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United States of America Patent

PATENT NO 5362525
SERIAL NO

08162702

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A process for modifying surfaces of fluorine resins including irradiating an ultraviolet laser beam on the surfaces in the presence of an inorganic silicon compound. The inorganic silicon compound could be a silicate, silicon oxide, silicon nitride, or silicon carbide.

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Patent OwnerAddress
JAPAN ATOMIC ENERGY RESEARCH INSTITUTE2-2 UCHISAIWAI-CHO 2-CHOME CHIYODA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Eguchi, Yosuke Takatsuki, JP 33 136
Kawanishi, Shunichi Neyagawa, JP 7 60
Nishii, Masanobu Kyoto, JP 6 93
Shimizu, Yuichi Mino, JP 85 540
Sugimoto, Shunichi Hirakata, JP 8 87
Tanaka, Tadaharu Neyagawa, JP 13 50

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