Method of manufacturing an oxide superconductor film
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United States of America Patent
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Sep 27, 1994
Grant Date -
N/A
app pub date -
Nov 27, 1992
filing date -
Mar 27, 1991
priority date (Note) -
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Abstract
The present invention provides a method of manufacturing a high quality oxide superconductor film capable of controlling the film-forming rate and the film composition easily and forming the superconductor film safely and economically, over a wide region and homogeneously, wherein each of elements of R in which R represents one or more of elements selected from the group consisting of Y and lanthanide series rare earth elements, Ba and Cu is vapor deposited in the state of metal on a substrate under a high vacuum of lower than 10.sup.-8 Torr by a vacuum vapor deposition process to form a precursor comprising an amorphous metal and the precursor is oxidized and crystallized by applying a heat treatment without taking out the same into the atmospheric air.

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- 15 United States
- 10 France
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- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER (50%) | 34-3 SHINBASHI 5-CHOME MINATO-KU TOKYO 105-0004 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Hase, Takashi | Ichikawa, JP | 92 | 1154 |
Kita, Ryusuke | Urayasu, JP | 14 | 322 |
Morishita, Tadataka | Ninomiyamachi-yamanishi, JP | 16 | 169 |
Sasaki, Masato | Mitaka, JP | 66 | 1034 |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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