Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride
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United States of America Patent
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Sep 20, 1994
Issued Date -
N/A
app pub date -
Apr 2, 1993
filing date -
Mar 6, 1992
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Expired
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Abstract
A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on benzolactone ring has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.
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