Semiconductor device, process for the production thereof and apparatus for microwave plasma treatment
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 13, 1994
Grant Date -
N/A
app pub date -
Mar 26, 1992
filing date -
Mar 29, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Disclosed are a semiconductor device comprising a semiconductor substrate, a first metal connection layers, a first substrate oxide layer having a specific form, and a second connection pattern layer; a process for producing the device; and a microwave plasma treatment apparatus having gas feed ports in a specific position. The highly reliable semiconductor devices can be produced at a high rate at high yields.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully