Gas plasma treatment for modification of surface wetting properties
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United States of America Patent
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Sep 6, 1994
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N/A
app pub date -
Apr 6, 1992
filing date -
Apr 6, 1992
priority date (Note) -
Expired
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Abstract
Efficiency of low pressure gas plasma processes is increased by addition of small quantities of water vapor to the primary gas constituting the plasma. Treated fabrics and polymer films show decreased wetting angle and increased capillary absorption, which beneficially affects the material's susceptibility to dyeing and impregnation.
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