Manufacture of carbon substrate for magnetic disk
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United States of America Patent
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Jun 21, 1994
Grant Date -
N/A
app pub date -
Mar 19, 1993
filing date -
Mar 19, 1993
priority date (Note) -
Expired
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Abstract
Disclosed is a method of manufacturing a carbon substrate for a magnetic disk capable of increasing the treatment rate leading to a lowering of the manufacturing cost, reducing the variation of the surface roughness of each substrate, and the variation of the surface roughness among the substrates in each lot. The surface of a carbon substrate is roughened to have a surface roughness Ra of 10-500 .ANG. by dry etching. The examples of the dry etching methods include chemical dry etching, barrel etching, plasma etching, RIE, RIBE, and ion milling.
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