Method for making microstructural surgical instruments
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United States of America Patent
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Jun 7, 1994
Grant Date -
N/A
app pub date -
Jan 16, 1992
filing date -
Jan 16, 1992
priority date (Note) -
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Abstract
A method of making a microsurgical cutter from a flat planar substrate having a top surface and a bottom surface comprises the steps of (a) forming a photoresist mask layer on the top surface in the pattern of the microsurgical instrument, the mask layer having an edge portion formed in a predetermined pattern therein; and then (b) etching isotropically the top surface of the substrate through the top surface to the bottom surface so that the top surface and bottom surface meet at a cutting edge portion, with the cutting edge portion having a configuration corresponding to the edge portion of the mask layer. The substrates may be formed from semiconductor materials such as silicon, silicon carbide, sapphire and diamond.
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