Electrode assembly useful in confined plasma assisted chemical etching
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United States of America Patent
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Mar 29, 1994
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N/A
app pub date -
Jul 15, 1993
filing date -
Jul 15, 1993
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Expired
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Abstract
An electrode assembly (10) for use in confined plasma assisted chemical etching includes an electrode (16) having a D.C. voltage source (46) connected thereto in addition to a source (60) of R. F. voltage such that ions formed during during plasma etching process are slowed or repelled from the electrode (16) as well as from a surrounding plasma confining member (18).
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