Method for control of photoresist develop processes

United States of America Patent

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Mar 8, 1994
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Oct 7, 1992
filing date
May 18, 1990

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Abstract

A method for the control of photoresist develop processes employing multiple spray-puddle steps in which process changes other than time, such as endpoint are used to determine the length of the spray and puddle steps.

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Patent Owner(s)

Patent Owner	Address
LUXTRON CORPORATION	3033 SCOTT BOULEVARD SANTA CLARA CA 95054-3316

International Classification(s)

G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....

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[Patents Count]

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Inventor Name	Address	# of filed Patents	Total Citations
Thomson, Mariste A	Santa Clara, CA	3	129

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Method for control of photoresist develop processes

Number of patents in Portfolio can not be more than 2000

United States of America Patent

07957660

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PATENT NO	5292605
SERIAL NO	07957660
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07957660

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