Apparatus for exposing periphery of an object
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United States of America Patent
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Feb 22, 1994
Issued Date -
N/A
app pub date -
Jan 14, 1993
filing date -
Apr 28, 1989
priority date (Note) -
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Abstract
A periphery exposing apparatus for exposing a periphery of a wafer having a curved circumferential peripheral portion and a linear portion comprises a spin chuck for rotatably supporting the wafer, a light source disposed above the spin chuck for exposing the wafer periphery, and a detector for detecting the line or portion. When the linear portion is being exposed, the light source is moved along the linear portion, rather than circularly around the periphery.
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