Method for depositing pure metal halide compositions
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United States of America Patent
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Jan 11, 1994
Issued Date -
N/A
app pub date -
May 13, 1985
filing date -
Oct 21, 1983
priority date (Note) -
Expired
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Abstract
Metal halide compositions of enhanced purity are produced by vapor phase deposition via reactions involving organometallic starting materials in a process wherein a carbon getter is provided in the reaction zone and/or adjacent the developing metal halide deposit. The carbon getter reduces carbon contamination in the product which can result from side decomposition reactions involving the organometallic starting materials.
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