Method and apparatus for gas phase synthesis
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United States of America Patent
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Jan 4, 1994
Grant Date -
N/A
app pub date -
Oct 31, 1991
filing date -
Nov 5, 1990
priority date (Note) -
Expired
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Abstract
A method of gas phase synthesis including the steps of measuring, by ellipsometry, optical properties of a surface of a sample on which a film is formed during formation of the film, and of evaluating the density of nucleation from changes in ellipsometric parameter angles during formation of of the film. An apparatus for gas phase synthesis includes a synthesizing chamber, a light source means which is disposed outside the synthesizing chamber for radiating polarized light into the synthesizing chamber, a light-inlet window mounted on the synthesizing chamber for introducing thereinto the light radiated from the light source means, a light-outlet window mounted on the synthesizing chamber for leading the light introduced from the light-inlet window and reflected from a substrate on which a film is being formed out of the synthesizing chamber, a light-receiving means for receiving the light reflected from the substrate and passed through the light-outlet window, and a data processing system for receiving an output signal from the light-receiving means for measuring and analyzing a density of nucleation.
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