Method of manufacturing a thin-film pattern on a substrate
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United States of America Patent
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Nov 9, 1993
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N/A
app pub date -
Sep 24, 1992
filing date -
Sep 24, 1991
priority date (Note) -
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Abstract
Disclosed is an improvement in a thin-film pattern manufacturing method which includes the steps of providing a thin film on a substrate, forming a mask having a desired pattern on the thin film, and patterning the thin film by removing an exposed portion of the thin film by etching. According to the improvement, the mask is manufactured by forming a layer of an organic resin on the thin film on the substrate and by forming the organic resin layer in the desired pattern by a mechanical forming member. In another embodiment, the organic resin is directly formed or moulded on the thin film by a forming or moulding member.
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