Aqueous developable deep UV negative resist
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 2, 1993
Issued Date -
N/A
app pub date -
Nov 23, 1992
filing date -
Apr 24, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Loading Importance Indicators... 
Abstract
A radiation-sensitive mixture useful as a negative-working photoresist composition comprising: (a) at least one novolak resin; and (b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.
Loading the Abstract Image...
OK
First Claim
Family
Loading Family data...
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully