Phenolic novolak resin compositions containing 5-indanol and their use in radiation-sensitive compositions
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United States of America Patent
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Oct 5, 1993
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Feb 22, 1993
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Jun 12, 1991
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Abstract
A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in radiation-sensitive compositions, especially those useful as positive-working photoresists.
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