Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye

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United States of America Patent

PATENT NO 5250392
SERIAL NO

08009194

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Abstract

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A negative-working, radiation-sensitive composition comprising an admixture in a solvent of: (a) at least one cyclized rubber polymer, (b) at least one photoactive compound, and (c) an effective contrast enhancing amount of at least one rubber-soluble azo dye containing a reactive acrylate or methacrylate group of formula (I): ##STR1## wherein Q is a reactive group of the structure ##STR2## wherein Y is either H or CH.sub.3 ; wherein R.sub.1 is either H, CH.sub.3, C.sub.2 H.sub.5, CH.sub.2 CH.sub.2 CN, CH CH.sub.2 OH or Q; wherein R.sub.2 is either H, CH.sub.3, OCH.sub.3, or NHCOCH.sub.3 ; wherein R.sub.3 is either H, OCH.sub.3 or OC.sub.2 H.sub.5 ; and wherein X is selected from the group consisting of an unsubstituted or a substituted benzene, thiazole, thiophene, benzothiazole, benzoisothiazole, thiadiazole, and pyrazole moiety having, if substituted, 1-3 substituent groups selected from cyano, nitro, acetyl, and halogen groups; the amount of said cyclized rubber being about 90% to 99.5% by weight, the amount of said photoactive component being about 0.5% to about 10% by weight, based on the total solids content of said radiation-sensitive composition.

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Patent Owner(s)

Patent OwnerAddress
OCG MICROELECTRONIC MATERIALS INCNORWALK CONNECTICUT 068546-4500

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Griffiths, John Garforth, GB 32 286
Marcotte, Jr Stephen F Cumberland, RI 3 9

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