Method of posttreating the focal track of X-ray rotary anodes

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United States of America Patent

PATENT NO 5246742
SERIAL NO

07879175

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Abstract

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The invention relates to a method of producing an X-ray rotary anode having a focal track region composed of refractory metals. The focal track region is manufactured by means of powder-metallurgy methods or by means of CVD or PVD methods. According to the invention, the focal track region is posttreated using high-energy electrons or photons by means of local, superficial melting to a depth of less than 1.5 mm. This reduces, in particular, the residual porosity in the focal track region. That results in improved mechanical properties, higher X-ray yield and markedly improved service life of such rotary anodes.

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Patent Owner(s)

Patent OwnerAddress
SCHWARZKOPF TECHNOLOGIES CORPORATION156 WEST 56TH STREET NEW YORK NY 10019

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Rodhammer, Peter Reutte, AT 9 71

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