Applique including chenille, backing, polymer film, and stitching
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United States of America Patent
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Sep 7, 1993
Grant Date -
N/A
app pub date -
Apr 27, 1992
filing date -
Apr 27, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An applique design is produced on a garment or other fabric article by providing chenille material having a fabric base and a plurality of cut or looped threads extending from an upper surface of a fabric base and applying a flexible backing material to a lower surface of the chenille material. The chenille material is cut to form edges having an outline of a desired design and disposed over a garment or fabric base. A polymer film is overlaid on the upper surface of the chenille material and a design is stitched over the film to the chenille material and the garment or fabric base, the stitching comprising closely spaced thread which covers and compresses portions of the film and chenille material, the film providing a barrier layer to prevent the thread loops from extending between the closely spaced thread of the stitching. The film is removed from unstitched portions of the upper surface of the chenille material whereby the desired design is formed by the stitched and unstitched portions of the chenille material.
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