Photogenerated polycarbodiimides from poly(tetrazole-5-thiones) and use in the preparation of coatings and deep-UV photoresists
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United States of America Patent
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Aug 31, 1993
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N/A
app pub date -
Apr 15, 1991
filing date -
Apr 15, 1991
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Expired
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Abstract
Photoresist formulations and coatings are provided which contain a polymer having pendant tetrazole-5-thione groups which upon exposure to ultraviolet light decompose to carbodiimides and thereby providing means for crosslinking the base polymer to provide high resolution and thermal stability.
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