Optical method for identifying or recognizing a pattern to be identified

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United States of America Patent

PATENT NO 5239595
SERIAL NO

07616248

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Abstract

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A method of obtaining a correlation between a pattern to be identified and a number of reference patterns by irradiating and displaying the pattern to be identified and the reference patterns on an optical display plane, thereby producing a complex optical amplitude distribution. This distribution is Fourier-transformed to produce a first power spectrum corresponding to the light intensity distribution of its Fourier transformation patterns. The patterns are again irradiated based upon the first power spectrum and a second Fourier transform is performed to produce a second power spectrum which is the light intensity distribution of the second Fourier transformation pattern. The area of this distribution is restricted by controlling the transmittance or the reflectance of each of the portions of the display plane.

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO CEMENT COMPANY LTDA CORP OF JAPAN TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takemura, Yasuhiro Shiroi, JP 13 508
Takesue, Toshiharu Chiba, JP 15 459

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