Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions
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United States of America Patent
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Aug 3, 1993
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N/A
app pub date -
Dec 3, 1992
filing date -
Sep 7, 1989
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Expired
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Abstract
Block phenolic oligomers of the formula (I): ##STR1## These may be reacted alone or with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby said resin having at least one unit of formula (II): ##STR2##
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