Method for purifying hydrogen peroxide for microelectronics uses
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United States of America Patent
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Aug 3, 1993
Grant Date -
N/A
app pub date -
Feb 26, 1992
filing date -
Mar 7, 1991
priority date (Note) -
Expired
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Abstract
A method for further purifying previously distilled hydrogen peroxide for use in microelectronics in which a hydrogen peroxide starting solution purified initially by distillation is contacted, after the addition of a small amount of chelating agent, with a non-ion-exchanging polymeric adsorbent, such as a styrene-divinylbenzene copolymer, to obtain a highly purified hydrogen peroxide solution which satisfies the stringent purity requirements for use in producing 4-megabit and 16-megabit microprocessor chips.
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